The precise polishing slurry produced by our company adopts the ultra fine Ceo2 and its main ingredients
are nanometer or micro CeO2. All these granularities are cubic shape. Good dispersivity, fine granularity, evenly grit distribution and modest hardness make this polishing slurry fit for the fine polishing of high precise optical fiber materials, electro glass, crystal glass, glass hard disk, crystal surface and integrated circuit etc. This product has the characteristics as follows: convenient usage, good suspension ability, high polishing efficiency, superior precise of polishing precision and stable and reliable quality.
types and specification:
Model Granularity (D50，μm) density（wt％） applications
CO-1D 0.8-1.2 20 MTRJ grinding
CO-1/2D 0.4-0.6 20 MTRJ grinding
CO-1/4D 0.2-0.3 20 Polishing
Different thickness and granularity of CeO2 polishing slurry can be customized according to customers’ requirement.
1. Before use, shake bottles of slurry well to ensure that all the grits are evenly suspended.
2. Dilute slurry by small amount of water.
● keep temperature above 0℃ to avoid frozen
● Frozen can result in irreversible product degradation.
Safety information: see the MSDS.
Contact Name: Teresa King
Company Name: Beijing Grish Hitech Co., Ltd.
Street Address: Rm401, Block C,
Zhongguancun Development Building,
No.12 Shangdi Information Rd.,
Haidian District, Beijing, China
Member name: bjgrish
Member Since: 17 May 2010
Total Leads: 18 bjgrish Import Export Business Leads
Business focus: Lapping Film, Slurry, Powder, Polishing Products
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